Superelasticity of Sputter-Deposited Ti-Ni Thin Films.

Effects of Cu on the microstructural and mechanical properties of sputter deposited Ni-Ti thin films

The microstructure of sputter deposited Ti-rich Ni-Ti thin films doped with Cu in the range 020.4 at.% and annealed for 1 h at 500 and 600°C has been investigated and correlated with the mechanical properties of the films measured by depth-sensing nanoindentation. X-ray diffraction analysis showed the microstructural evolution of Ni-Ti thin films when doped with Cu and annealed at different tem...

Physical Properties of Reactively Sputter-Deposited C-N Thin Films

This work aims to prepare and study amorphous carbon nitride (CNx) films. Films were deposited by reactive magnetron radiofrequency (RF) sputtering from graphite target in argon and nitrogen mixture discharge at room temperature. The ratio of the gas flow rate was varied from 0.1 to 1. Deposited films were found to be amorphous. Highest Nitrogen concentration achieved was 42 atomic percent whic...

ANISOTROPIC SUPERELASTICITY OF TEXTURED Ti-Ni SHEET

A recently developed crystal-mechanics-based constitutive model for polycrystalline shape-memory alloys (Thamburaja and Anand [1]) is shown to quantitatively predict the in-plane anisotropy of superelastic sheet Ti-Ni to reasonable accord. Keywords— Phase transformations, Constitutive equations, Finite-elements, Mechanical testing.

Growth, structure and stability of sputter-deposited MoS2 thin films

Molybdenum disulphide (MoS2) thin films have received increasing interest as device-active layers in low-dimensional electronics and also as novel catalysts in electrochemical processes such as the hydrogen evolution reaction (HER) in electrochemical water splitting. For both types of applications, industrially scalable fabrication methods with good control over the MoS2 film properties are cru...

Metal-to-insulator transition in sputter deposited 3NiÕAl thin films